New Machines


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Wafer N2 Purging

N2 purging for Existing Wafer Stocker

Wafer N2 Purging Development Background

Features



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High Density Reticle Stocker (CDRX)

Protect Reticle and Reticle Pod with One Stocker

Reticle /POD Stocker Development Background

Specifications
Cycle Time(s) Input 60sec
Reticle Storage (Purging) 1920 cells
Pod Storage (Purging Option) 60 Pods
Reticle Storage Patented Reticle Storage Cell
Storage Cleanliness ISO CLASS1
Anti-Seismic Function (Option) SN:633 gal, EW786 gal (The Great East Japan Earthquake Requirements)

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Tool Station (TS300/TS300RV)

Detachable Tool Front FOUP Buffer to Enhance Tool Productivity

Tool Station Development Background

Specifications
  TS300 TS300RV
Cycle Time(s) 15 (s) 30 (s)
Number of Buffer 4-12FOUP 2-6 FOUP
Install & Adjustment Time 360 min 360 min
Tool Modification Less None

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TS300

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TS300RV

Type

Features